Analytical & Scientific Instruments

Deep-UV excimer lasers enable controlled UV laser ablation that produces clean ablation with minimal thermal impact. This low-thermal ablation behavior reduces elemental fractionation and preserves spatial fidelity during laser ablation, making the technique particularly suitable for high-precision LA-ICP-MS and ICP-TOF-MS measurements.

Short nanosecond pulses generate well-defined ablation craters with minimal thermal effects, supporting efficient particle transport into ICP-MS and TOF-MS detection systems. The resulting low-thermal ablation improves analytical stability and enables rapid elemental imaging, high-resolution mapping, and fast transient detection.

MLase GmbH develops compact excimer UV laser sources optimized for integration into LA-ICP-MS and LA-TOF-MS platforms. These systems deliver stable UV pulses that ensure reproducible laser ablation and reliable analytical performance across a wide range of materials, supporting high-precision spectroscopic workflows including UV spectroscopy and advanced elemental analysis.

Water- or liquid-cooled operation allows continuous operation with repetition rates up to 1 kHz, enabling stable laser ablation and consistent measurement conditions in both laboratory and industrial analytical environments.

In LIBS measurements, a short high-energy laser pulse creates a localized plasma on the sample surface. This plasma generation produces characteristic spectral lines that allow accurate identification of the elemental composition of the material. Deep-UV excimer pulses interact efficiently with many solid materials, enabling stable plasma formation and controlled ablation across metals, alloys, ceramics, soils, minerals, and geological samples.

The clean ablation behavior of excimer-based LIBS systems reduces thermal effects and improves spectral reproducibility, ensuring reliable analytical results. High repetition rates also enable rapid scanning and elemental imaging workflows used in modern LIBS instruments for process monitoring and laboratory analysis.

MLase GmbH develops compact excimer LIBS laser sources optimized for integration into analytical platforms and spectroscopic instrumentation. Their stable nanosecond pulses, high repetition rates, and water- or liquid-cooled operation support continuous operation up to 1 kHz, enabling stable laser-induced plasma generation and repeatable analytical measurements in both laboratory and industrial environments.

In laser ionization aerosol mass spectrometry, individual particles are ionized as they pass through the instrument, allowing chemical composition to be measured in real time. Deep-UV excimer wavelengths such as 193 nm and 248 nm UV laser radiation interact strongly with organic and inorganic aerosol constituents, enabling efficient ionization with minimal fragmentation and stable ion formation during particle analysis.

These systems can ionize airborne aerosol particles across a wide particle-size range, supporting detailed analysis of atmospheric aerosols, particulate matter, industrial emissions, and combustion by-products. Stable pulse energy and high repetition rates of the UV laser enable fast transient detection and single-particle analysis, making the technology suitable for environmental monitoring and atmospheric research applications.

MLase GmbH develops compact excimer UV laser sources optimized for integration into specialized aerosol mass spectrometry platforms including LIZA-MS instruments. Their stable UV pulses support reliable laser ionization and advanced spectroscopic workflows in OEM analytical instruments designed for real-time particle characterization.

In laser-based photolysis experiments, a short ultraviolet pulse triggers molecular dissociation, producing radicals and transient intermediates that can be analyzed using time-resolved spectroscopy. The 248 nm wavelength of KrF excimer lasers provides the high UV photon energies required to drive photochemical reactions in many gas-phase and molecular systems.

The nanosecond pulse structure of a UV laser enables precisely timed reaction initiation, supporting kinetic measurements, transient absorption spectroscopy, and fluorescence analysis. Stable pulse energy and wavelength ensure reproducible experimental conditions, which is essential for controlled photolysis experiments and analytical research workflows.

In specialized research applications, excimer-driven photolysis can also break down aerosol or particulate species. The resulting fragments can be detected through characteristic fluorescence or spectroscopic signatures, sometimes referred to as Excimer Laser Fragmentation Fluorescence Spectroscopy (ELFFS).

MLase GmbH develops compact UV laser sources designed for integration into scientific photochemistry setups and analytical instrumentation. Their stable deep-UV output enables reliable photolysis and spectroscopic analysis in laboratory and OEM research platforms used for molecular analysis and reaction kinetics.

In optical laboratories and industrial metrology systems, deep-UV illumination is widely used for advanced optics testing and sensor testing, allowing engineers to detect defects, analyze material behavior, and evaluate optical performance that cannot be observed at visible wavelengths. Excimer lasers operating at 193 nm and 248 nm deliver intense UV pulses that enable high-resolution inspection of optical substrates, coatings, photomasks, sensors, and micro-optical components.

These short-wavelength UV light source systems enable controlled illumination of surfaces and optical structures, supporting coating characterization, transmission measurements, defect detection, and precision optics testing of photonic devices.

Because many optical materials exhibit strong absorption or unique scattering behavior in the deep-UV range, excimer-based illumination can reveal nanoscale surface imperfections, subsurface defects, and coating irregularities that remain invisible at longer wavelengths. Such capabilities are widely used in photonics research, semiconductor inspection, and optical manufacturing quality control.

MLase GmbH develops compact excimer UV light source systems designed for integration into optical test benches, metrology systems, and scientific instrumentation. With stable pulse energy and reliable UV emission, these systems provide consistent illumination for high-precision optics testing and optical characterization in both laboratory and industrial environments.